| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resist composition that responds not only to ultraviolet rays, such as I-line or g-line, but also to visible rays, excimer laser beam like that of KrF, electron beams, extreme-ultraviolet radiation (EUV), X-rays, and radiation, such as ion beams. <P>SOLUTION: The radiation-sensitive resist composition contains a resist compound (A) which is a polyphenol compound, produced by the condensation reaction of (a) 7-38C and 3-4 valent aromatic aldehyde, with (b) a compound, having 6-15C and 1-3 phenol hydroxyl groups and a regist compound of which the molecular weight is 800-5,000; an acid generator (B), which directly or indirectly generates acid by the irradiation of visible rays, ultraviolet rays, excimer laser beam, electron beams, extreme-ultraviolet radiation (EUV), X-rays, and one of the radiations selected from among a group, consisting of ion beams; and an acid crosslinking agent (C). <P>COPYRIGHT: (C)2008,JPO&INPIT |
