| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus to be used for lithography of a semiconductor integrated circuit, in which the vibration of a vacuum robot that conveys a wafer to a wafer stage is reduced. <P>SOLUTION: The exposure apparatus for conveying a wafer from a load lock chamber 15 to a wafer stage 29 inside a vacuum chamber 11 is provided with a first vacuum robot 25, placed in the vacuum chamber 11 and transferring the wafer from the load lock chamber 15, and a second vacuum robot 27 placed in the vacuum chamber 11 and transferring the wafer to the wafer stage 29. The first vacuum robot 25 is to be driven independently of the second vacuum robot 27. <P>COPYRIGHT: (C)2008,JPO&INPIT |
