发明名称 SUBSTRATE FILM FOR DICING
摘要 PROBLEM TO BE SOLVED: To provide a substrate film for dicing wherein its cutting waste associated with the dicing process of a semiconductor wafer (the thread form or mustache form waste generated from a film after dicing) is rarely generated and its static electricity removing performance is excellent, and to provide a dicing film. SOLUTION: The first layer of the multilayer substrate film for dicing contains the resin composition 100 pts.wt. comprising a styrene-butadiene copolymer (SEBS) 30-80 wt.% and a polypropylene-based resin (PP) 20-70 wt.% and contains an antistatic agent 10-45 pts.wt. The second layer contains the resin composition comprising the SEBS 40-90 wt.% and the PP 10-60 wt.%. The third layer contains a thermoplastic resin having a rubber elasticity. The first, second, and third layers are laminated in this order. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008147341(A) 申请公布日期 2008.06.26
申请号 JP20060331640 申请日期 2006.12.08
申请人 GUNZE LTD 发明人 SAGO SHIGERU;YOKOI MASAYUKI;OKAGAWA MASAAKI
分类号 H01L21/301;C09J7/02 主分类号 H01L21/301
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