发明名称 APPARATUS AND METHOD FOR CARRYING OUT PCVD DEPOSITION PROCESS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and a method for carrying out a PCVD deposition process. SOLUTION: The apparatus in which one or more doped or undoped glass layers are coated onto the interior of a glass substrate tube, comprises an applicator having an inner wall and an outer wall and a microwave guide which opens into the applicator. The applicator extends around a cylindrical axis and which is provided with a passage adjacent to the inner wall, through which the microwaves supplied via the microwave guide can exit. Over the cylindrical axis the substrate tube can be positioned, and the applicator is fully surrounded by a furnace that extends over the cylindrical axis. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008144271(A) 申请公布日期 2008.06.26
申请号 JP20070293910 申请日期 2007.11.13
申请人 DRAKA COMTEQ BV 发明人 VAN STRALEN MATTHEUS JACOBUS N;HARTSUIKER JOHANNES ANTON;LINDERS MOLTHOFF ANTONIUS HENRICUS JOHANNES PETRUS MARIA;MILICEVIC IGOR
分类号 C23C16/511;C03B8/04;C03B37/018 主分类号 C23C16/511
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