| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion plating device for forming a smooth thin film on a substrate, to provide a thin film formation method, and to provide a substrate with a smooth surface obtained thereby. SOLUTION: In the ion plating device 1, a plasma beam 17 generated by a plasma generator 11 and made to flow out to the inside of a vacuum chamber 3 is guided to the surface of a vapor deposition material 21 by the magnetic force of a magnet 23, and emitted to the vapor deposition material 21. The vapor deposition material 21 is evaporated by the emission of the plasma beam 17 and is further ionized, and is vapor-deposited onto a substrate 25 located at an opposite position, so as to form a thin film. The magnet 23 can perform an elevation movement in the vicinity of a hearth 19, and the magnetic flux density of the surface in the vapor deposition material 21 changes in accordance with the elevation movement of the magnet 23. By changing the magnetic flux density of the surface in the vapor deposition material 21, the form of the plasma beam 17 changes. COPYRIGHT: (C)2008,JPO&INPIT
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