发明名称 INTEGRATED CIRCUIT INCLUDING A CHARGE COMPENSATION COMPONENT
摘要 A charge compensation component having a drift path between two electrodes, an electrode and a counterelectrode, and methods for producing the same. The drift path has drift zones of a first conduction type and charge compensation zones of a complementary conduction type with respect to the first conduction type. A drift path layer doping comprising the volume integral of the doping locations of a horizontal drift path layer of the vertically extending drift path including the drift zone regions and charge compensation zone regions arranged in the drift path layer is greater in the vicinity of the electrodes than in the direction of the centre of the drift path.
申请公布号 US2008150073(A1) 申请公布日期 2008.06.26
申请号 US20070961235 申请日期 2007.12.20
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 WILLMEROTH ARMIN;MAUDER ANTON;SEDLMAIER STEFAN
分类号 H01L29/00;H01L21/20 主分类号 H01L29/00
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