| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and device for efficiently cleaning a substrate, and also to provide an exposure device comprising the same. <P>SOLUTION: To provide a cleaning device which comprises a radiating unit for radiating laser beam having a pulse width of pico second or femto second. The substrate is cleaned with the laser beam. <P>COPYRIGHT: (C)2008,JPO&INPIT |
