发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR RESIST PATTERN FORMATION, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
摘要 <p>This invention provides a photosensitive resin composition comprising (A) a binder polymer comprising a divalent group represented by general formula (I), a divalent group represented by general formula (II), and a divalvent group represented by general formula(III), (B) a photopolymerizable compound, and (C) a photopolymerization initiator comprising a hexaarylbiimidazole compound containing at least one alkoxy group having 1 to 5 carbon atoms. (I) (II) (III) wherein R&lt;SUP&gt;1&lt;/SUP&gt;, R&lt;SUP&gt;3&lt;/SUP&gt;, and R&lt;SUP&gt;5&lt;/SUP&gt; each independently represent a hydrogen atom or a methyl group; R&lt;SUP&gt;2&lt;/SUP&gt; and R&lt;SUP&gt;4&lt;/SUP&gt; each independently represent an alkyl group having 1 to 3 carbon atoms, an alkoxy group, an OH group, or a halogen atom; and m and n are each independently an integer of 0 to 5.</p>
申请公布号 WO2008075531(A1) 申请公布日期 2008.06.26
申请号 WO2007JP72623 申请日期 2007.11.22
申请人 HITACHI CHEMICAL COMPANY, LTD.;MURAMATSU, YUKIKO;MIYASAKA, MASAHIRO;NANKAWA, HANAKO 发明人 MURAMATSU, YUKIKO;MIYASAKA, MASAHIRO;NANKAWA, HANAKO
分类号 G03F7/004;G03F7/031;G03F7/033 主分类号 G03F7/004
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