| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a film having a fine pattern with no mask or stamper. SOLUTION: The film forming method has a process of applying a solution 20 dissolved with a film material in a solvent onto a substrate 10, a process of reducing the partial pressure of the gas in the vicinity of the solution consisting of the same ingredients as those of the solution applied onto the substrate, down to the first partial pressure equal to or lower than the saturation vapor pressure of the solvent, and a process of increasing the partial pressure of the gas to the second partial pressure equal to or higher than the saturation vapor pressure of the solvent. COPYRIGHT: (C)2008,JPO&INPIT
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