| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of decomposing a target pattern containing features to be printed on a wafer into multiple patterns. <P>SOLUTION: The method includes steps of: (a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of the target pattern; (c) determining if an edge of another feature is within the region of influence with respect to the vertex; and (d) splitting the another feature into two polygons if the edge of another feature is within the region of influence. <P>COPYRIGHT: (C)2008,JPO&INPIT |
