| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner that restrains influence to the periphery of a mechanism for measuring a position in a Z direction and can be made light and controlled highly, and to provide a device manufacturing method using the aligner. <P>SOLUTION: The aligner comprises: a Z interferometer 7 as a first interferometer for discharging first measurement light 16c for measuring a position in a first direction crossing the bottom surface of a slight movement stage 3 that is a reticle stage 102 at a right angle; a slight movement Z mirror 13 as a first mirror provided on the bottom surface of the slight movement stage 3; and a reflector 16a as a second mirror provided directly below the slight movement Z mirror 13, thus guiding the first measurement light 16c discharged from the Z interferometer 7 to the slight movement Z mirror 13 via the reflector 16a. The first measurement light 16c reflected by the slight movement Z mirror 13 is returned to an interferometer 7 via the reflector 16a, thus measuring a position in the first direction of the slight movement stage 3. <P>COPYRIGHT: (C)2008,JPO&INPIT |
