| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface modifier for a resist modifying the surface of a photoresist film to sufficiently enhance the wettability with a developer solution and excellent in safety, and to provide a method for formation of a resist pattern with the modifier. SOLUTION: The surface modifier for a resist consists of an aqueous solution containing: at least one kind of amine oxide compound having a 8-20C alkyl group or hydroxyalkyl group which may be interrupted by an oxygen atom and two of 1-5C alkyl groups or hydroxyalkyl groups; and at least one kind of amine oxide compound having two of 8-20C alkyl groups or hydroxyalkyl groups which may be interrupted by an oxygen atom and a 1-5C alkyl group or hydroxyalkyl group. COPYRIGHT: (C)2008,JPO&INPIT |
