| 摘要 |
A clean chemistry composition includes an organic acid and a polar surfactant. The clean chemistry composition is capable of imparting an electrical charge to particles generated during a CMP operation on a wafer made up of semiconductors having a metal gate structure. The imparted electrical charge has the same polarity as that of an electrical charge on the wafer surface, such that the resulting repulsive force between the wafer surface and the newly-charged particles is sufficient to repel the particles from the wafer surface.
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