| 摘要 |
Polycrystalline silicon thin films are each fixed to the same potential and are each formed under the protective film of each of a plurality of pixel regions for receiving red light, a plurality of pixel regions for receiving green light, and a plurality of pixel regions for receiving blue light, and each polycrystalline silicon thin films has a different thickness for selectively transmitting a received light wavelength of each of the plurality of pixel regions for receiving red light, the plurality of pixel regions for receiving green light, and the plurality of pixel regions for receiving blue light to function as a color filter. The color filter can be formed during an IC manufacturing process while the color filter is positioned to align with the pixel region serving as a light receiving element, with higher precision.
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