发明名称 EMISSION DETECTING ANALYSIS SYSTEM AND METHOD OF DETECTING EMISSION ON AN OBJECT
摘要 An apparatus for analyzing emission is provided to shorten an interval of time for analyzing a defect by analyzing the physical structure of an emission point from an inspection target. A stage(110) on which an inspection target(112) is placed is installed in a chamber(90). A SEM(scanning electron microscope) column acquires the image of the inspection target, installed in the chamber. An emission detector column(118) detects the light emission of the inspection target, installed in the chamber. The stage can rotate at a predetermined angle, having a rotation axis(A3) parallel with a stage surface.
申请公布号 KR20080057597(A) 申请公布日期 2008.06.25
申请号 KR20060131080 申请日期 2006.12.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, HO JIN
分类号 H01L21/66 主分类号 H01L21/66
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