| 摘要 |
A nonconductive coating method using a multilayer film is provided to form a nonconductive deposition film with a uniform thickness, irrespective of a shape of an object to be processed, by scattering vaporized tin. A device to be processed(4) is inserted into a vacuum chamber. A conductive metal, which is mounted on a target inside the vacuum chamber, is vaporized, such that a deposition film(44) is formed on a surface of the device to be processed. An ion beam is irradiated on the deposition film, which is formed by a deposition coating process, such that a micro crack is formed. The micro crack is converted to a nonconductive film during the ion beam irradiation process. A non-conductive film(48) is deposited on the deposition film after the ion beam irradiation process.
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