发明名称 |
RETAINING RING WITH CONDUCTIVE PORTION |
摘要 |
A retaining ring for use with electrochemical mechanical processing is described. The retaining ring has a generally annular body formed with a conductive portion and a non- conductive portion. The non-conductive portion contacts the substrate during polishing. The conductive portion is electrically biased during polishing to reduce the edge effect that tends to occur with conventional electrochemical mechanical processing systems.
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申请公布号 |
KR20080058514(A) |
申请公布日期 |
2008.06.25 |
申请号 |
KR20087014381 |
申请日期 |
2008.06.13 |
申请人 |
APPLIED MATERIALS INC. |
发明人 |
MANENS ANTOINE P.;SHRAUTI SURESH;DUBOUST ALAIN;WANG YAN;CHEN LIANG YUH;LUI FENG Q.;BUTTERFIELD PAUL D.;MAVLIEV RASHID |
分类号 |
B24B37/04;B24B37/32;B24B41/06;H01L21/304 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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