发明名称
摘要 A thin sheet manufacturing method with very high manufacturing efficiency and at a revolutionarily low manufacturing cost per unit area both achieved by expanding the production scale and a thin sheet manufacturing apparatus. A silicon thin sheet (1) is manufactured by the process including a dipping step in which the surface portion of a base sheet (2) is dipped in a silicon melt (10), and silicon is made to adhere to the surface of the base sheet. After the silicon thin sheet (1) formed on the surface (2a) of the base sheet (2) is separated from the base sheet, at least the peripheral portion (4) of the silicon thin sheet (1) is cut. Since a high-quality silicon thin sheet can be manufactured at a high efficiency, the manufacturing cost can be lowered.
申请公布号 JP4105158(B2) 申请公布日期 2008.06.25
申请号 JP20040517275 申请日期 2003.06.25
申请人 发明人
分类号 C30B29/06;C30B19/00;C30B29/64 主分类号 C30B29/06
代理机构 代理人
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