RECOVERY CUP CLEANING METHOD AND SUBSTRATE TREATMENT APPARATUS

摘要

A recovery cup cleaning method is provided to control an inflow of a cleaning solution into a chemical recovering path even if the inner wall of a recovery space is cleaned by a cleaning solution by exhausting a cleaning solution of a cleaning solution cleaning step and cleaning chemicals of a chemical cleaning step through a waste path. The inner wall of a recovery space is cleaned by using a cleaning solution in a cleaning solution cleaning step. The inner wall of the recovery space is cleaned in a chemical cleaning step by using cleaning chemicals which are the same kind of the chemicals to be recovered through the recovery space. The cleaning solution guided to the recovery space in the cleaning solution cleaning step and the cleaning chemicals guided to the recovery space in the chemical cleaning step are guided to a different waste path from a chemical recovery path so as to be wasted in a waste step. The recovery space can be disposed to surround the periphery of a substrate rotation unit for gripping and rotating the substrate. Keeping abreast of the cleaning solution cleaning step and the chemical cleaning step, a substrate rotation unit operating step for operating the substrate rotation unit is performed. The cleaning solution cleaning step can include a cleaning solution supply step for supplying a cleaning solution to the substrate rotation unit. The chemical cleaning step can include a chemical supply step for supplying a cleaning chemical to the substrate rotation unit.