发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.
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申请公布号 |
US7390614(B2) |
申请公布日期 |
2008.06.24 |
申请号 |
US20050091905 |
申请日期 |
2005.03.29 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GIJSBERTSEN JOHANNES G.;DE JAGER PIETER W. H.;NIJKERK MICHIEL D. |
分类号 |
G03F7/20;G03F9/00;G03F7/00;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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