发明名称 Method for through-plating field effect transistors with a self-assembled monolayer of an organic compound as gate dielectric
摘要 A method for through-plating field effect transistors with a self-assembled monolayer of an organic compound as gate dielectric includes through-plating by patterning a gate electrode material, and bringing an organic compound having dielectric properties into contact with the contact hole material and the gate electrode material. A contact hole material and the gate electrode material are at least partially uncovered. The contact hole is material not identical to the gate electrode material. A self-assembled monolayer of the organic compound is formed above the gate electrode material. The method also includes depositing and patterning the source and drain contacts without removing the self-assembled monolayer of the organic compound, and depositing a semiconductor material.
申请公布号 US7390703(B2) 申请公布日期 2008.06.24
申请号 US20050062766 申请日期 2005.02.22
申请人 INFINEON TECHNOLOGIES, AG 发明人 KLAUK HAGEN;HALIK MARCUS;ZSCHIESCHANG UTE;SCHMID GUENTER;BRAUN STEFAN
分类号 H01L21/00;C07F7/08;C07F9/38;C08F132/06;C08F132/08;H01L21/316;H01L21/768;H01L21/84;H01L51/40 主分类号 H01L21/00
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