METHOD AND APPARATUS FOR CONTROLING EXHAUST IN MANUFACTURING SEMICONDUCTOR DEVICE

摘要

A method and an apparatus for controlling an exhaust amount in a semiconductor manufacture process is provided to minimize the attachment of a fume in an exhausting pipe by exhausting the fume through an exhausting pipe having a constant cross-section. An amount of exhaust gas generated in a semiconductor manufacture process is measured(S11). The measured exhaust amount and a predetermined reference exhaust amount are compared(S12). According to the comparison result, control gas is introduced into the exhaust gas to control the amount of the exhaust gas. The control gas introduction process includes a procedure for calculating an introduction amount of the control gas for equalizing the predetermined reference exhaust amount with the measured exhaust amount(S13), and a procedure for introducing the control gas into the exhaust gas by the calculated introduction amount(S14).