发明名称 |
CHARGE TRAP MEMORY DEVICE USING NANODOT AS CHARGE TRAP SITE |
摘要 |
<p>A charge trap memory device using a nano dot as a charge trap site is provided to simultaneously improve a write-read characteristic and a charge retention characteristic by solving a thermal stability problem of a memory device including a conventional pure metal nano dot. A charge trap memory device(10) includes a gate structure(20) on a substrate(11). In the gate structure, a plurality of metal oxide nano dots are discontinuously disposed as a charge trap site. The gate structure can include a tunneling insulation layer(21), the metal oxide nano dot(23) formed on the tunneling insulation layer, a blocking insulation layer(25) formed on the metal oxide nano dot, and a gate electrode(27) formed on the blocking insulation layer. First and second impurity regions(13,15) can be formed on the substrate to come in contact with the tunneling insulation layer.</p> |
申请公布号 |
KR20080056590(A) |
申请公布日期 |
2008.06.23 |
申请号 |
KR20060129679 |
申请日期 |
2006.12.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, SANG MOO;CHA, YOUNG KWAN;SEOL, KWANG SOO;PARK, SANG JIN;SHIN, SANG MIN;PARK, JU HEE |
分类号 |
H01L27/115 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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