发明名称 METHOD FOR PRODUCING SUBSTRATE HAVING THIN FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a thin film-fitted substrate having excellent adhesion between a thin film and a substrate, optical properties and productivity, and having various functions. <P>SOLUTION: In the method for producing a thin film-fitted substrate where, using a thin film deposition device at least comprising: (A) a substrate carrying means; (B) a sputtering means provided along the circumference of the substrate carrying means; and (C) a plasma generating means provided separately from the sputtering means along the circumference of the substrate carrying means, a vapor-deposited film is deposited on a substrate by a sputtering means, thereafter, the vapor-deposited film and plasma generated by the plasma generating means are brought into reaction, so as to deposit a thin film, as the substrate, a molded body of a resin composition comprising: (a) an acrylic resin; and (b) an aliphatic polyester-based resin is used. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008138268(A) 申请公布日期 2008.06.19
申请号 JP20060327229 申请日期 2006.12.04
申请人 ASAHI KASEI CHEMICALS CORP 发明人 KUBO KIMIHIRO;YONEZAWA JUN
分类号 C23C14/58;C23C14/06;G02B1/11 主分类号 C23C14/58
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