发明名称 ANALYZING METHOD FOR EXHAUST GAS FROM SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To determine, in order to determine exhaust weights of components of an object to be measured, such as fluoro-compounds included in an exhaust gas from semiconductor equipment, a flow rate of a pump-exhaust gas from a pump installed in the downstream of the semiconductor manufacturing equipment high-precisely and correctly, and to thereby determine the exhaust weight of components of the object high-precisely. <P>SOLUTION: A known amount of a standard gas is added to the exhaust gas in the upper stream and the down stream of a pump 4 which absorbs the exhaust gas from the semiconductor manufacturing equipment 1 and is supplied with a sealing gas; the exhaust gas, the sealing gas, and the standard gas are mixed; the concentration of the standard gas in the pump-exhaust gas exhausted from the pump is quantity determined; the flow rate of the pump-exhaust gas is calculated from the concentration of the standard gas obtained and the amount of the standard gas added; the concentration of the components of the object in the pump-exhaust gas; and the exhaust weights of the components of the object are calculated from this concentration of the components of the object and the flow rate of the pump-exhaust gas. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008139242(A) 申请公布日期 2008.06.19
申请号 JP20060328033 申请日期 2006.12.05
申请人 TAIYO NIPPON SANSO CORP 发明人 ISAKI RYUICHIRO;SAKATA SUSUMU
分类号 G01N1/00;G01N21/35;G01N21/3504 主分类号 G01N1/00
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