发明名称 ANTIGEN EXPOSURE CHAMBER AND METHOD OF WASHING/DRYING THE SAME
摘要 An antigen exposure chamber whose washing and drying can be performed speedily in high quality; and a method of washing/drying the antigen exposure chamber. There is provided an antigen exposure chamber including a washing water feeding unit for feeding of a washing water for washing of the antigen exposure chamber; a washing nozzle connected to the washing water feeding unit and designed so as to inject the washing water fed from the washing water feeding unit into the interior of the antigen exposure chamber and a duct of fan unit to thereby conduct washing; a floor surface of the antigen exposure chamber; and a discharge unit disposed below the floor surface and designed so as to carry out not only evacuation from the floor surface of the antigen exposure chamber but also at the time of washing, collecting and draining of the washing water.
申请公布号 KR20080055961(A) 申请公布日期 2008.06.19
申请号 KR20087010059 申请日期 2005.09.28
申请人 SHINRYO CORPORATION 发明人 FUJITA TOSHIO;TANG HUAIPENG;SETA AKIHIRO;OKUDA MINORU;HASHIGUCCI KAZUHIRO;OKUBO KIMIHIRO
分类号 C12M1/00;B08B3/02;B08B3/10 主分类号 C12M1/00
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