TECHNIQUES FOR CONFINING ELECTRONS IN AN ION IMPLANTER
摘要
<p>Apparatus and a method for confining electrons in an ion implanter are disclosed. The apparatus and method comprise a first array of magnets (31) and a second array of magnets (32) positioned along at least a portion of a beam path (30), the first array being on a first side of the beam path and the second array being on a second side of the beam path, the first side opposing the second side.' At least one magnet (302) in the first array may have a pole facing an opposite pole of a corresponding magnet (302) in the second array, on the first and second arrays of magnets may collectively produce cusp magnetic fields to confine electrons in or near the beam path.</p>
