发明名称 SUBSTRATE MOUNTING TABLE AND METHOD FOR MANUFACTURING SAME, SUBSTRATE PROCESSING APPARATUS, AND FLUID SUPPLY MECHANISM
摘要 A substrate mounting table, a method for manufacturing the same, a substrate processing apparatus, and a fluid supply mechanism are provided to prevent a hole blockage of a fluid flow channel due to a thermal spraying residual by employing a curved surface in an inner wall of the fluid flow channel. A substrate mounting table(5) has a mounting surface on which a substrate is mounted, a plurality of gas discharge holes(23) for supplying gas onto the mounting surface, a plane-shaped member having a gas supply channel(14) for supplying gas to the gas discharge holes. The substrate mounting surface is provided with a ceramic thermal spraying layer for coating the mounting surface. An inner wall of the gas supply channel corresponding to the gas discharge hole is formed in a curved surface. The gas supply channel is shared by the gas discharge holes. The plane-shaped member is configured by joining a first plane-shaped member having the gas discharge holes and a second plane-shaped member having a groove of which bottom is a curved surface shape.
申请公布号 KR20080055645(A) 申请公布日期 2008.06.19
申请号 KR20070127552 申请日期 2007.12.10
申请人 TOKYO ELECTRON LIMITED 发明人 UEDA TAKEHIRO;KOBAYASHI YOSHIYUKI;OOHASHI KAORU
分类号 H01L21/68;H01L21/67 主分类号 H01L21/68
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