Manufacture method of semiconductor device structure using self-aligned epitaxial layers,申请号KR20060092657-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Manufacture method of semiconductor device structure using self-aligned epitaxial layers
摘要
申请公布号	KR100839752(B1)	申请公布日期	2008.06.19
申请号	KR20060092657	申请日期	2006.09.25
申请人		发明人
分类号	H01L21/336;H01L29/78	主分类号	H01L21/336
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Examining table leg rest

Driving mount for gyratory centrifugals

Cutting-off device

Safety device for aeroplanes

Pruner, fruit picker, and weeder

Electrical device

Grooving machine

Fabric separator

Apparatus for converting reciprocating motion into rotary motion or vice versa

Machine tool for dressing articles on nonparallel surfaces

Locomotive valve gear

VINYL ESTER PRODUCT

Bottle filling machine

Internal combustion engine

Article carrier