发明名称 |
Method for Manufacturing Dielectric Thin Film Capacitor |
摘要 |
A method for manufacturing a dielectric thin film capacitor without causing cracks in a protective layer which covers a capacitor portion is provided. The method for manufacturing the dielectric thin film capacitor includes a step of forming a tapered resist pattern on a capacitor structure and a dry etching step so as to taper the end portion of the capacitor. Furthermore, a heating treatment is conducted after tapering.
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申请公布号 |
US2008145996(A1) |
申请公布日期 |
2008.06.19 |
申请号 |
US20070954696 |
申请日期 |
2007.12.12 |
申请人 |
NOMURA MASANOBU;TAKESHIMA YUTAKA;HAGI TOSHIO;NAKAGAWA NAOTOSHI |
发明人 |
NOMURA MASANOBU;TAKESHIMA YUTAKA;HAGI TOSHIO;NAKAGAWA NAOTOSHI |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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