发明名称 METHOD FOR MANUFACTURING MAGNETIC RANDOM ACCESS MEMORY
摘要 PROBLEM TO BE SOLVED: To provide a method capable of inhibiting deterioration of magnetic characteristics by protecting a magnetoresistance effect element from outgas of an interlayer film. SOLUTION: The method includes steps of forming a material layer which is used for the magnetoresistance effect element 23, forming the magnetoresistance effect element 23 by processing at least a part of the material layer, and forming a protecting film 24 covering sides of the magnetoresistance effect element 23 under consistent vacuum condition within a device which is formed by processing at least a part of the material layer. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008141210(A) 申请公布日期 2008.06.19
申请号 JP20070329123 申请日期 2007.12.20
申请人 TOSHIBA CORP 发明人 ASAO YOSHIAKI;YODA HIROAKI
分类号 H01L21/8246;H01L27/105;H01L43/08 主分类号 H01L21/8246
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