| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus capable of measuring temperature and temperature distribution in a silicon substrate, accompanying operation and in a silicon substrate being heat-treated in-line. SOLUTION: The apparatus for treating substrate has a thermography system 28, where thermography system measures the temperature and the temperature distribution of the silicon substrate W being heat-treated by a heating plate 10, and a lens comprising the optical system of the thermography system 28 is formed by a germanium material. COPYRIGHT: (C)2008,JPO&INPIT
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