| 摘要 |
PROBLEM TO BE SOLVED: To generally provide apparatus and methods for providing necessary capacitive decoupling to a large area substrate in a plasma reactor. SOLUTION: One embodiment of the invention provides a substrate support to be used in a plasma reactor. The plasma reactor comprises an electrically conductive body having a top surface with a plurality of raised areas configured to be contact with a back surface of a large area substrate, and the plurality of raised areas occupy less than about 50% of the surface area of the top surface. COPYRIGHT: (C)2008,JPO&INPIT |
