IMPLANT APPARATUS COMPRISING POSITION VARIABLE WAFER CASSETTE AND METHOD OF LOADING/UNLOADING WAFER IN SAME IMPLANT APPARATUS

摘要

An ion implantation apparatus including a position-variable wafer cassette is provided to save the time interval necessary for conventional pumping and venting processes by eliminating the necessity of a pumping process and a venting process during an ion implantation process. A plurality of wafers are fixed by a disk chamber(200) that maintains a predetermined angle with respect to an ion beam to inject ions to the wafer by the predetermined angle. A position-variable wafer cassette(100) supplies the wafer to the disk chamber and enables variation of its position. A pumping process and a venting process are performed even during an ion implantation process according to the predetermined angle of the disk chamber by the position-variable wafer cassette. The predetermined angle can include a twist angle and a tilt angle. The position-variable wafer cassette varies in position in a manner that the pumping and venting processes are performed according to the twist angle and the tile angle of the disk chamber during an ion implantation process of the disk chamber.