| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a micromachine at high accuracy while reducing manufacturing processes and manufacturing costs, and also to provide a micromachine. <P>SOLUTION: This method for manufacturing a micromachine, in which functional elements 50 are spaced on a substrate 1, includes steps of: forming a first film 20 on the substrate 1, a step for forming a second film 30 on the first film 20, a step for forming the functional elements 50 on the second film 30; and a step of spacing the functional element 50 on the substrate 1 by etching the first film 20 below the functional elements 50 by an etchant having selectivity between the first film 20 and the second film 30. <P>COPYRIGHT: (C)2008,JPO&INPIT |
