| 摘要 |
PROBLEM TO BE SOLVED: To effectively prevent damage of device elements contained in an object to be cleaned. SOLUTION: A cleaning apparatus includes a gas tank 22, gas valve 26, chemical tank 20, mixing nozzle 18, electrode 10 and the like, and computing section 14 and the like. The gas tank 22 feeds a gas. The gas valve 26 adjusts the feeding amount of the gas per unit time. The chemical tank 20 feeds a chemical. The mixing nozzle 18 mixes the gas fed from the gas tank 22 and the chemical fed from the chemical tank 20, and sprays the cleaning solution. The electrode 10 and the like detect the current value that corresponds to the electric charge amount of the cleaning solution. The computing section 14 and the like control the adjusting means so as to reduce the feeding amount of the gas per unit time when the absolute value of the current is equal to or greater than a threshold. COPYRIGHT: (C)2008,JPO&INPIT
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