| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of stably moving up and down a splash preventing member while achieving facilitation of maintenance work and space saving. SOLUTION: The substrate treatment apparatus 100 is provided with a spin chuck 21 for horizontally holding a substrate W and rotating the substrate W around a rotation center line P of a perpendicular direction. A cup 10 is provided so as to surround the spin chuck 21. The cup 10 consists of an inner constituent member 11, an intermediate constituent member 12 and an outer constituent member 13. A pair of first lifting mechanisms 81 is provided on the lower part of the inner constituent member 11. Servo motors 119 of the pair of first lifting mechanisms 81 are driven synchronously with each other by a control unit. COPYRIGHT: (C)2008,JPO&INPIT
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