| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a sputtering target provided with a backing plate, by jointing a blank of a discoidal target with a blank of a backing plate. SOLUTION: The method for manufacturing the sputtering target provided with the backing plate includes the steps of: overlapping the blank 1 of the discoidal target made of a metal having high hardness and having protrusions 21 on one side, on the blank 3 of the discoidal backing plate made of a metal having lower hardness than that of the blank 1 of the discoidal target and having superior heat conductivity so that the protrusions 21 on the blank of the discoidal target contacts with the blank of the discoidal backing plate; and then pressure-jointing the sputtering target with the backing plate. All apexes 7 of the protrusions 21 formed on one side of the blank of the discoidal target are tilted towards the center of the blank of the discoidal target. COPYRIGHT: (C)2008,JPO&INPIT
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