发明名称 METHOD FOR FORMING A METAL STRUCTURE
摘要 A semiconductor wafer comprises a plurality of die areas, at least a first scribe line area and at least a second scribe line area surrounding each die area, at least a first metal structure positioned in the first scribe line area, and at least a second metal structure positioned in the second scribe line area. The first metal structure comprises at least a first slot split parallel to the first scribe line area, or comprises a plurality of openings arranged in an array. The second metal structure comprises at least a second slot split parallel to the second scribe line area, or comprises a plurality of openings arranged in an array.
申请公布号 US2008146024(A1) 申请公布日期 2008.06.19
申请号 US20060611888 申请日期 2006.12.17
申请人 发明人 KUO CHIEN-LI;WU PING-CHANG;JAO JUI-MENG;CHEN HUI-LING;HO KAI-KUANG;YANG CHING-LI
分类号 H01L21/4763 主分类号 H01L21/4763
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