POLYMER FOR RADIOSENSITIVE RESIN COMPOSITION, RADIOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a polymer for a radiosensitive resin composition having ≥1.72 refractive index at 193 nm wavelength and to be contained in the radiosensitive resin composition for forming a patternable resist film.

SOLUTION: This polymer for the radiosensitive resin composition has a structure expressed by formula (1) [wherein, X, Y are each independently O or S; and (m), (n) are each independently an integer of 1 to 3].

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