| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a wafer container capable of efficiently removing contamination gas which has an adverse effect on a semiconductor wafer out of the space in a container with simple, non-bulky, and inexpensive configuration, and capable of selectively and effectively performing contamination gas removal so as to correspond to use environments. <P>SOLUTION: At least one kind of chemical absorber 19 for adsorbing specific gas component is arranged over almost entire range, expanding in the axial direction of a plurality of semiconductor wafers W, in at least one space which is formed with an inside wall space of a lid 2 and a wafer support body 7. The chemical absorber is attached to the wafer support body 7 by an absorber hooking part 18 formed at reinforcing frames 15 and 16 of the chemical absorber 19. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
