发明名称 SUBSTRATE MOUNTING TABLE AND METHOD FOR MANUFACTURING SAME, SUBSTRATE PROCESSING APPARATUS, AND FLUID SUPPLY MECHANISM
摘要 A substrate mounting table includes a plate shaped member provided with a mounting surface for mounting a substrate thereon, a plurality of gas injection openings opened on the mounting surface to supply a gas toward the mounting surface, and a gas supply channel for supplying the gas through the gas injection openings; and a thermally sprayed ceramic layer covering the mounting surface. At least inner wall portions of the gas supply channel are formed in curved surface shapes, the inner wall portions facing the gas injection openings.
申请公布号 US2008142160(A1) 申请公布日期 2008.06.19
申请号 US20070954832 申请日期 2007.12.12
申请人 TOKYO ELECTRON LIMITED 发明人 UEDA TAKEHIRO;KOBAYASHI YOSHIYUKI;OOHASHI KAORU
分类号 H01L21/3065;B21D53/00;C23C16/40;C23C16/458 主分类号 H01L21/3065
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