| 摘要 |
<p>An exposure method which can be applied also to liquid immersion exposure is provided, and high alignment accuracy can be obtained through such method. At the time of exposing a shot area (SA1) on a substrate (P) by relatively scanning a substrate (P) and a projection area (17P), in a status where an image of a reticle pattern is projected on the projection area (17P) on the substrate (P) through a projection optical system, measuring light is applied within shot areas (SA2-SA5) adjacent to the shot area (SA1), not through the projection optical system, and position information is measured. Based on the position information of the shot area (SA1) obtained from the measurement results, relative positional relationship between the projection area (17P) and a shot area (SA1) is controlled.</p> |
