发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 PROBLEM TO BE SOLVED: To provide a high voltage applying terminal without increasing the number of manufacturing processes and manufacturing cost in a semiconductor integrated circuit. SOLUTION: A transfer gate 54 comprising a high voltage-resistant NMOS (T4) and a pull-up resistor 55 are provided. An input terminal of the transfer gate 54 is connected to a high voltage applying terminal 50 and an output terminal of the transfer gate 54 is connected to a CMOS inverter 52 via an input resistor 51. One of the ends of the pull-up resistor 55 is connected to the output terminal of the transfer 54 and to the other end of the pull-up resistor 55, a source voltage VDD (5V) is applied. The transfer gate 54 lowers inputted high voltage VX (VX>VDD) down to VDD-Vt1'. The pull-up resistor 55 biases voltage of the output terminal of the transfer gate 54 to the VDD and raises the voltage of the output terminal lowered by the transfer gate 54 almost to the VDD. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008141292(A) 申请公布日期 2008.06.19
申请号 JP20060323024 申请日期 2006.11.30
申请人 SANYO ELECTRIC CO LTD;SANYO SEMICONDUCTOR CO LTD 发明人 TAKAHASHI SHUICHI
分类号 H03K19/003;H01L21/822;H01L27/04;H03K17/08;H03K17/687;H03K19/0175;H03K19/094 主分类号 H03K19/003
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