发明名称 APPARATUS FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus capable of measuring the temperature and temperature distribution of a substrate that is being heat-treated. SOLUTION: In the apparatus, a plurality of substrates W are heat-treated simultaneously with a plurality of heat treatment units 10a, 10b, 10c, 10d, and the tips of fiber scopes 16a, 16b, 16c, 16d are arranged for each heat treatment unit so that each substrate is positioned in the viewing angle of the objective lens at the tip. Eye-piece section sides 20a, 20b, 20c, 20d of respective fiber scopes are optically connected to a single thermography system 24 via a changeover device 22 for alternately changing a transmission line; and the temperature and the temperature distribution of the substrate being treated by each heat treatment unit are each measured for monitoring. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008141085(A) 申请公布日期 2008.06.19
申请号 JP20060327794 申请日期 2006.12.05
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HARUMOTO MASAHIKO
分类号 H01L21/027;H01L21/304 主分类号 H01L21/027
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