| 摘要 |
A method and an apparatus for preventing arcing at ports exposed to plasma in plasma processing chambers are provided to prevent unnecessary glow by using a slit door valve for sealing a substrate transfer port of an etching chamber. A chamber body has a substrate entrance port. A door is adjacent to the substrate entrance port. The door has a surface exposed to a region in the chamber body in which plasma is formed. One or more circuit parts(160B) are selected in response to excitation frequency of the plasma as a ground path connecting the door to a ground. The circuit part provides a predetermined impedance between the door and the ground. The circuit part can be controlled or replaced. The door includes a sealing panel(152), a driving panel(154), and a dielectric spacer(156). The sealing panel is adjacent to the substrate entrance port. The driving panel is connected to the sealing panel. The dielectric spacer electrically insulates the driving panel and the sealing panel. The dielectric spacer accommodates the circuit part.
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