发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a three-dimensional nonvolatile semiconductor memory device that achieves both advantages of higher memory density and improved performance. SOLUTION: The nonvolatile semiconductor memory includes: a first nonvolatile memory cell formed above a substrate through a first insulating film; and a second nonvolatile memory cell formed above the first nonvolatile memory cell through a second insulating film. The first nonvolatile memory cell includes: a first semiconductor layer containing an n-type region and a p-type region; and a first gate stack which is formed above the first semiconductor layer and contains a first charge accumulating layer and a first control gate electrode. The second nonvolatile memory cell includes: a second semiconductor layer containing an n-type region and a p-type region; and a second gate stack which is formed above the second semiconductor layer and contains a second charge accumulating layer and a second control gate electrode in positional adjustment to the first gate stack. The first control gate electrode functions as a back gate electrode to the second nonvolatile memory cell. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008140912(A) 申请公布日期 2008.06.19
申请号 JP20060324471 申请日期 2006.11.30
申请人 TOSHIBA CORP 发明人 NISHIHARA KIYOHITO;ARAI FUMITAKA
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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