发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a three-dimensional nonvolatile semiconductor memory device that achieves both advantages of higher memory density and improved performance. SOLUTION: The nonvolatile semiconductor memory includes: a first nonvolatile memory cell formed above a substrate through a first insulating film; and a second nonvolatile memory cell formed above the first nonvolatile memory cell through a second insulating film. The first nonvolatile memory cell includes: a first semiconductor layer containing an n-type region and a p-type region; and a first gate stack which is formed above the first semiconductor layer and contains a first charge accumulating layer and a first control gate electrode. The second nonvolatile memory cell includes: a second semiconductor layer containing an n-type region and a p-type region; and a second gate stack which is formed above the second semiconductor layer and contains a second charge accumulating layer and a second control gate electrode in positional adjustment to the first gate stack. The first control gate electrode functions as a back gate electrode to the second nonvolatile memory cell. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008140912(A) |
申请公布日期 |
2008.06.19 |
申请号 |
JP20060324471 |
申请日期 |
2006.11.30 |
申请人 |
TOSHIBA CORP |
发明人 |
NISHIHARA KIYOHITO;ARAI FUMITAKA |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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地址 |
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