发明名称 PROBE STATION AND TESTING METHOD FOR A WAFER USING THE SAME
摘要 A probe station and a testing method for a wafer using the same are provided to improve accuracy of wafer position, and to prevent wafer damage owing to sliding of the wafer. A wafer is disposed on a chuck which has a penetration hole passing through vertically to the upper plane. A plurality of support pins(200) are located at the lower part of the chuck, respectively comprises vacuum holes passing through the top and bottom ends. A vacuum device(300) adheres the wafer to the top end of the plural support pins by configuring the inner side of the plural vacuum hole as a vacuum state.
申请公布号 KR20080055313(A) 申请公布日期 2008.06.19
申请号 KR20060128464 申请日期 2006.12.15
申请人 SECRON CO., LTD. 发明人 KIM, MEANG KWON;JIN, JEON HO;CHOI, KI UK;CHOI, SU HYUN
分类号 H01L21/66 主分类号 H01L21/66
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