发明名称 METHOD FOR MANUFACTURING METAL OXIDE THIN FILM HAVING CONTROLLED SURFACE FINE STRUCTURE AND THE METAL OXIDE THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a new method for manufacturing a metal oxide thin film, using a precursor solution of a photochromic metal oxide, irradiation with an ultraviolet ray, and electric field application; and to provide a method for controlling a surface fine structure by irradiation with an ultraviolet ray and electric field application. SOLUTION: The method for manufacturing the metal oxide thin film comprises forming a metal oxide thin film having a controlled surface fine structure on a substrate by using a precursor solution of a photochromic metal oxide. In the method for manufacturing the metal oxide thin film, two sheets of electroconductive substrates are immersed in the precursor solution of the photochromic metal oxide while applying an electric field between the electroconductive substrates used as electrodes, and then dip-coating, drying, calcining and a rapid heating treatment are performed to manufacture the thin film. The metal oxide thin film having a controlled surface fine structure, manufactured by the method, and a member using the metal oxide thin film are provided. Thereby, the metal oxide thin film having a controlled surface fine structure and the method for manufacturing the same can be provided. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008137869(A) 申请公布日期 2008.06.19
申请号 JP20060327646 申请日期 2006.12.04
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 NISHIZAWA KAORI;KATO KAZUMI;FUKAYA HARUHIKO;MIKI TAKESHI;SUZUKI KAZUYUKI
分类号 C01G25/02;C01B13/32;C01G1/02 主分类号 C01G25/02
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