发明名称 NONVOLATILE MEMORY ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory element and its manufacturing method. SOLUTION: In the nonvolatile memory element having a switching element, and a storage node connected with the switching element, the storage node 100 includes a lower metal layer 60 of an Al layer connected with an impurity region 42 of the switching element, a first insulating layer 62 of alumina, an intermediate metal layer 64 of an Al layer, a second insulating layer 66 of alumina, an upper metal layer 68 of an Au layer, a carbon nanolayer 70 of a fullerene layer, and a passivation layer 80 of SiO2, wherein the layers are formed in order on the lower metal layer 60. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008141193(A) 申请公布日期 2008.06.19
申请号 JP20070298513 申请日期 2007.11.16
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 MOON CHANG-WOOK;DEN JUSHAKU;EL MOSTAFA BOURIM;RYO GENTOKU
分类号 H01L27/10;H01L45/00;H01L49/00;H01L51/05;H01L51/30 主分类号 H01L27/10
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